产品规格书
SPECIFICATIONS
深紫外核心材料 · NPSS/AlN外延片/模板
WAlN-NS400
≥ 5 μm，(002) ≤ 200 arcsec，(102) ≤ 200 arcsec
湖北深紫科技有限公司
Hubei DUVTek Co., LTD.
湖北省鄂州市梧桐湖新区凤凰大道9号东湖高新科技创意城B08栋
Building B08, Donghu High-tech Innovation City, No. 9 Fenghuang Avenue, Wutong Lake New District, Ezhou, Hubei, China
| 性能 Properties | 参数值 Value |
|---|---|
| 直径 Diameter | 2 inch (50.8±0.05 μm) |
| 衬底类型 Substrate | NPSS (Nanopattern Sapphire Substrate) |
| 衬底厚度 Substrate Thickness | 430±20 μm |
| 外延层厚度 Epilayer Thickness | ≥ 5 μm |
| (002) 晶体质量 Crystal quality (FWHM of 002 XRC) | ≤ 200 arcsec |
| (102) 晶体质量 Crystal quality (FWHM of 102 XRC) | ≤ 200 arcsec |
| 正面粗糙度 Front side roughness | ≤ 1 nm |
| 边缘扣除 Edge exclusion | ≤ 3 mm |
| 贯穿裂纹 Through Crack | none |
| a面(11-20)取向 Surface orientation of a-plane | 0°±0.1° |
| m面(11-20)取向 Surface orientation of m-plane | 0.2°±0.1° |
| 定位边晶向 Primary flat orientation | a-plane±0.1° |
| 定位边长度 Primary flat length | 16±1 mm |
| 反面粗糙度 Back side roughness | 0.8±0.2 μm |